发明名称 IMMERSION EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, AND EVALUATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which can evaluate the surface touching the liquid well while suppressing occurrence of poor exposure. <P>SOLUTION: The exposure apparatus includes an immersion member which can form an immersion space such that the optical path of exposure light is filled with liquid, a first liquid collection opening which can collect at least a part of liquid on an article facing the immersion member, and a second liquid collection opening which is arranged on the outside of the first liquid collection opening for the optical path of exposure light and can collect at least a part of liquid on the article. When the article is moved for the immersion member, the exposure apparatus evaluates the surface state of the article based on the collection state of liquid from the second liquid collection opening. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008300772(A) 申请公布日期 2008.12.11
申请号 JP20070148042 申请日期 2007.06.04
申请人 NIKON CORP 发明人 NAGASAKA HIROYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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