| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a transfer mask for exposure, which can cope with such a case that patterns need to be changed, and partial cells have some inconveniences, or the like, in a character projection method; and to provide a method for exchanging the patterns. <P>SOLUTION: In a transfer mask 10 for exposure, a mask section 11 includes: one or a plurality of blocks 14 having one or a plurality of cells; supports 18 for supporting the block 14; and an adhesive member 16 that can make the block 14 and support 18 adhere to each other and remove them. Each of the supports 18 includes: a stopper 15 for positioning the block 14, wherein the block 14 is bonded to the stopper 15 with the adhesive material 16; and a beam section 17 provided so that it supports the stopper 15 and is overlapped with a part of the block 14. The blocks 14 can be removed by removing the adhesive member 16 and can be replaced with a new block. The adhesive member contains carbon. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
