IMPACT ABSORBING DEVICE AND PLASMA THIN FILM PROCESS APPARATUS INCLUDING THE SAME

摘要

A crash buffer and an apparatus for processing thin film including the crash buffer are provided to prevent the supply tube in advance by decentralizing the loads concentrated to one end portion of the supply tube connecting the processing chamber and the reacting gas providing unit. The crash buffer(190) comprises the buffer member. The buffer member is equipped on the top of the chamber defining the reaction zone. The buffer member fixes the reacting gas providing unit(160) supplying the reaction gas. The buffer member comprises the first fix piece(191), the second fixture piece(193), and the elastic member(200). The first fix piece is fixed on the top of the chamber. The second fixture piece is fixed to the reacting gas providing unit. The first and the second fixture piece are connected by the elastic member.