发明名称 VAPORIZER, THIN-FILM FORMING APPARATUS, AND MOCVD APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vaporizer for MOCVD, which can obtain a vaporized gas in which a material solution is uniformly dispersed, and to provide a method for vaporizing the material solution. SOLUTION: The vaporizer has: (1) a dispersion part 8 having a gas introducing port 4 for introducing a pressurized carrier gas 3 to a gas passage, a means for supplying a material solution 5a to the gas passage, and a gas exit 7 for sending the carrier gas containing the material solution to a vaporization part 22; (2) a vaporization part 22 including a vaporization tube 20, one end of which is connected to a reaction tube of an MOCVD system and the other end of which is connected to the gas exit 7, and a heating means for heating the vaporization tube 20, and for heating and vaporizing the carrier gas containing the material solution sent from the distribution part 8; and (3) the distribution part 8 having a main body 1 of the dispersion part having a cylindrical hollow part, a rod 10 having an outer diameter smaller than an inner diameter of the cylindrical hollow part, and a spiral groove 60 on the side of the vaporization part 22 in the periphery of the rod 10, wherein the rod 10 is inserted into the cylindrical hollow part. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008300871(A) 申请公布日期 2008.12.11
申请号 JP20080210130 申请日期 2008.08.18
申请人 WATANABE SHOKO:KK;TSUDA MASAYUKI 发明人 TSUDA MASAYUKI;KUSUHARA MASAKI;DOI MIKIO;UMEDA MASARU;FUKAGAWA MITSURU;SUGANO YOICHI;UCHISAWA OSAMU;YAMAMOTO KOHEI;MEGURO TOSHIKATSU
分类号 H01L21/205;C23C16/448 主分类号 H01L21/205
代理机构 代理人
主权项
地址