COATING AND DEVELOPING DEVICE, OPERATION METHOD OF COATING AND DEVELOPING DEVICE, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide techniques for collecting a substrate which is not suitably coated with a protective film without adversely affecting a normal substrate and for facilitating removing operation for the protection film in a coating and developing device applied to liquid immersion exposure. SOLUTION: The abnormal substrate which is not suitably coated with the protective film for liquid immersion exposure is not carried into an exposure unit, but held at a standby module and after the previous substrate is carried out of the exposure unit and carried into a specified module, for example, a heating module before development, the abnormal substrate is carried into the specified module to exert no adverse influence on what is called scheduled conveyance and also to perform processing on the abnormal substrate at a protection film removing unit. COPYRIGHT: (C)2009,JPO&INPIT