| 摘要 |
PROBLEM TO BE SOLVED: To carry out a wafer easily even if the wafer is held for a long time on a spinner table of a cleaning device. SOLUTION: In the cleaning device 25 comprising at least a turnable spinner table 250 having a surface 250d for suction holding a wafer, a suction source 252 for transmitting a suction force to the holding surface 250d, and a nozzle 251 for supplying cleaning water to a wafer held on the spinner table 250, pores communicating with the suction source 252 are formed in the holding surface 250d, and the suction source 252 has a switching portion for selecting a first suction force acting during the rotation of the spinner table 250 and a second suction force acting during the stop of the spinner table 250. COPYRIGHT: (C)2009,JPO&INPIT |
