| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the performance of an excess operation stage in order to solve the problem that the control of the excess operation stage is made difficult when the deformation of the stage is minimized or evaded. <P>SOLUTION: This stage system for a lithography apparatus includes the stage, an excessively specified number of actuators arranged so as to operate on the stage, and a power source configured to supply currents to the actuators. The currents are supplied to a coil related to the first actuator of the actuators and a coil related to the second actuator of the actuators. <P>COPYRIGHT: (C)2009,JPO&INPIT |
