发明名称 Method of Evaluating Quality of Silicon Single Crystal
摘要 In the crystal growth rate (V), there is such a permissible range that the given quality of silicon single crystal can be maintained. This permissible range is determined in advance. The log data of crystal growth rate (V) is measured in the pulling up of silicon single crystal, and using the log data, the actual value of crystal growth rate (V) is determined. The actual value is compared with the permissible range. Any region of silicon single crystal corresponding to crystal growth rate (V) falling within the permissible range is judged as being a conforming region satisfying given standards, while any region of silicon single crystal corresponding to crystal growth rate (V) falling outside the permissible range is judged as being a defective region not satisfying given standards.
申请公布号 US2008302295(A1) 申请公布日期 2008.12.11
申请号 US20050659061 申请日期 2005.08.01
申请人 KOTOOKA TOSHIROU;MATSUKUMA SHIN;SAISHOJI TOSHIAKI 发明人 KOTOOKA TOSHIROU;MATSUKUMA SHIN;SAISHOJI TOSHIAKI
分类号 C30B15/20 主分类号 C30B15/20
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