| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid immersion exposure apparatus capable of restricting the deterioration of throughput while suppressing the occurrence of poor exposure. <P>SOLUTION: The liquid immersion apparatus includes: a first member; a memory device for storing information concerning a relation between a relative moving speed and a moving distance of a material movable relatively to the first member with respect to the first member where liquid between the material and the first member can maintain a predetermined state; and a determination device for determining relative moving conditions of the material with respect to the first member based on the stored information in the memory device so that the liquid between the first member and the material maintains the predetermined state. <P>COPYRIGHT: (C)2009,JPO&INPIT |
