| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating mechanism capable of applying a liquid material thinly, uniformly and quickly and an apparatus for correcting a defect by using the coating mechanism. SOLUTION: The apparatus for correcting the defect by using the coating mechanism is characterized in that a tapered part 2 is formed at the tip of a coating needle 1, a flat plane 3 is formed at the tip of the tapered part, a correction fluid 4 is applied to the tip of the coating needle 1, the correction fluid-applied tip of the coating needle 1 is brought into contact with a substrate 5 and the coating needle 1 of such a contacted state is moved in parallel to the substrate 5 to apply the correction fluid 4 linearly. Therefore, the correction fluid 4 can be applied thinly, uniformly and quickly. COPYRIGHT: (C)2009,JPO&INPIT |
