发明名称 |
Method for fabricating polymer ridged waveguides by using tilted immersion lithography |
摘要 |
This invention is a method for fabricating polymer ridged waveguides by using tilted immersion lithography. It includes the steps of: 1. preparing step; 2. calculating step; 3. first tilted immersion lithography step; 4. rotating 180-degree step; 5. second tilted immersion lithography step; and 6. finishing step. By these two tilted immersion lithography steps as well as the rotating 180-degree step between them, the UV light refracts and makes the photoresist forming a 45-degree ridged waveguide. This fabricating method is simple and stable. It can reduce the fabricating time and cost. Also, it is suitable for mass production and it has wide-ranged applications.
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申请公布号 |
US2008305438(A1) |
申请公布日期 |
2008.12.11 |
申请号 |
US20070000348 |
申请日期 |
2007.12.12 |
申请人 |
YANG HSIHARNG;WU CHUNG CHIUNG |
发明人 |
YANG HSIHARNG;WU CHUNG CHIUNG |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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