EXPOSURE METHOD, METHOD OF MANUFACTURING PLATE FOR FLAT PANEL DISPLAY, AND EXPOSURE APPARATUS

摘要

An exposure method facilitating the formation of a fine pattern on a plate. The exposure method illuminates a mask (M1) with illumination light and exposes a plate (P) using a mask pattern of the mask (M1). The method includes scanning the plate (P) relative to the mask (M1) in a scanning direction (Y), which is an in-plane direction of the plate (P), and exposing the plate (P) while scanning the plate (P) relative to the mask (M1). The exposing of the plate while scanning the plate relative to the mask includes performing fine period exposure with a fine period mask pattern (IPA) formed in a first region of the mask (M1) and middle density exposure with a middle density mask pattern (MPA) formed in a second region of the mask (M1). The first region and the second region are arranged adjacent to each other in the scanning direction (Y).