HARDMASK COMPOSITION HAVING ANTIREFLECTIVE PROPERTIES AND METHOD OF PATTERNING MATERIAL ON SUBSTRATE USING THE SAME

摘要

A hardmask composition having antireflective properties is provided. The hardmask composition is suitable for lithography and provides excellent optical properties and mechanical properties. In addition, the hardmask composition can be readily applied by spin-on application techniques. Particularly, the composition is highly resistant to dry etching. Therefore, the composition can be used to provide a multilayer thin film that is capable of being patterned with a high aspect ratio. Further provided is a method for forming a pattern using the composition.