TREATING DEVICE OF INDUCTIVELY COUPLED PLASMA

摘要

An antenna for an inductively coupled plasma processing device using a ferrite is provided to generate uniform plasma with a large size by maximizing the size of an internal electric field as a ferrite antenna. An inductively coupled plasma processing device includes a first antenna(100), and a second antenna. The first antenna generates the inductively coupled plasma. The second antenna includes a ferrite(110) and a conductive line(120) formed in a circumference of the ferrite. The first antenna is equipped in the center. The second antenna is equipped in the circumference of the first antenna.