PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME

摘要

Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, wherein x is an integer of 1 to 5, y is an integer of 2 to 6, R is a C2~C20 hydrocarbon group. The photoresist composition comprises 1~85 weight % of a photo-sensitive compound represented by following Formula 1, 1~55 weight % of a compound which reacts with a hydroxyl group (-OH) of the compound represented by Formula 1 to combine with the photo-sensitive compound represented by Formula 1; 1~15 weight % of a photo-acid generator; and 12~97 weight % of an organic solvent.