发明名称 Apparatus and Method for Surface Modification Using Charged Particle Beams
摘要 An apparatus and method for using high beam currents in FIB circuit edit operations, without the generation of electrostatic discharge events. An internal partial chamber is disposed over the circuit to be worked on by the FIB. The partial chamber has top and bottom apertures for allowing the ion beam to pass through, and receives a gas through a gas delivery nozzle. A non-reactive gas, or a combination of a non-reactive gas and a reactive gas, is added to the FIB chamber via the partial chamber, until the chamber reaches a predetermined pressure. At the predetermined pressure, the gas pressure in the partial chamber will be much greater than that of the chamber, and will be sufficiently high such that the gas molecules will neutralize charging induced by the beam passing through the partial chamber.
申请公布号 US2008302954(A1) 申请公布日期 2008.12.11
申请号 US20060092786 申请日期 2006.11.07
申请人 FIBICS INCORPORATED 发明人 PHANEUF MICHAEL WILLIAM;LAGAREC KEN GUILLAUME;KRECHMER ALEXANDER
分类号 H05H3/00;B05B1/00;H05K3/00 主分类号 H05H3/00
代理机构 代理人
主权项
地址