| 摘要 |
A near-field exposure mask and a near-field exposure method, the exposure mask including a light blocking film having an opening and configured to expose an object to be exposed by use of near-field light generated at the opening, wherein the opening of the exposure mask has a plurality of processing pitches and an opening width, and wherein, when the opening width of the opening is denoted by s (nm), the processing pitch is denoted by p (nm), a dimensionless parameter is denoted by E and coefficients are denoted by <u style="single">a and b, the opening has the opening width which satisfies equation (1), equation (2), equation (3) and equation (4) below <?in-line-formulae description="In-line Formulae" end="lead"?>s=ap-b+18.82E (1)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>0.67<=E<=1 (2)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>0.056<=a<=0.083 (3)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>2.53<=b<5.08. (4)<?in-line-formulae description="In-line Formulae" end="tail"?>
|
