EYE MARGIN COMPUTING DEVICE, EYE MARGIN COMPUTING METHOD, EYE MARGIN COMPUTING PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM STORING THE PROGRAM

摘要

The central position of the eye pattern produced by superimposing a waveform signal piece segmented from the waveform signal generated by a simulator is computed. Assuming that a mask serving as a quality evaluation criterion of the eye pattern is disposed in the central position, the time coordinate value and voltage coordinate value of each of the feature point which the mask has are computed. Feature points not on the time axis are handled as the ones to be processed. From the voltage coordinate values of the feature points and the voltage coordinate values of the points of the waveform signal piece associated with the feature points, the margin in the direction of the voltage axis is computed. Next, feature points on the time axis are handled as the ones to be processed. From the time coordinate values of the feature points and the time coordinate values of the points of the waveform signal piece associated with the feature points, the margin in the direction of the time axis is computed. With this constitution, the margin which the eye pattern generated by the simulator has for the mask used as a quality evaluation criterion can be automatically computed with high accuracy.