Projection lens for microlithographic projection illumination system for forming mask on light sensitive layer, has two compensation units arranged on different position along optical axis, where refractive lens are provided between units

摘要

The projection lens (100) has refractive lenses (113-119, 131-140, 142-143) made of non-optical uniaxial material, where one of the lenses exhibits intrinsic birefringence. Two compensation units (111, 112, 141) are provided for the partial compensation of the intrinsic birefringence, where each compensation unit includes an optical uniaxial crystal material. The compensation units introduce no delay for a light that passes through an optical axis (OA). The compensation units are arranged on different position along the optical axis, where the refractive lens are provided between the units. An independent claim is also included for a method for microlithographic production of a micro-structured component.