| 摘要 |
An alkaline aqueous solution composition is provided to improve prevents electrical feature and to ensure improvement of throughput by preventing metal from being absorbed to the surface of a substrate. An alkaline aqueous solution composition contains a chelating agent and a alkali component expressed as the general equation(1). In the equation, R may be acceptable that arbitrary 1 or 2 hydrogens are substituted with an identical or different substitution radical, and is C 2~6 alkylene group, 1, 2- cyclohexylene group or 1, 2- phenylene group; ring A and B may be acceptable that arbitrary 1 or 2 hydrogens are substituted with an identical or different substitution radical, and is a benzene ring.
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