FABRICATION METHOD OF NANOSTRUCTURE USING NANOPORE ARRAY

摘要

A manufacturing method of a nanostructure is provided to remove selectively only an oxide of a conductive layer formed at a lower part of a nanopore and to expose a catalyst layer for grow a bottom electrode or a nanowire using a nanopore array. A manufacturing method of a nanostructure comprises steps of: forming in order a conductive layer(13) and an anodic oxide quality layer on a substrate; anodizing the anodic oxide quality layer and forming a plurality of nanopores; exposing the oxide of the conductive layer formed between a surface of the anodic oxide quality layer and a lower part of the oxide of the conductive layer space by removing the oxide of the anodic oxide quality layer formed at the lower part of nanopore; and exposing the conductive layer at a lower part of the nanopore by removing the oxide of the exposed conductive layer.