| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type resist composition having such good performance as not to cause development defects and good line edge roughness. SOLUTION: In the positive type resist composition containing (A) a compound which generates an acid when irradiated with active light or radiation, (B) a resin which is decomposed by the action of the acid and increases its solubility in an alkali developing solution, (C) an organic basic compound and (D) a fluorine- and/or silicon-containing surfactant, the resin (B) contains a hydroxystyrene/t-butyl acrylate copolymer (generally called ESCAP) and a copolymer obtained by introducing a styrene unit into ESCAP. |
