Apparatus for liquid treatment of wafers,申请号EP20030018179-传众专利搜索

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发明名称	Apparatus for liquid treatment of wafers
摘要
申请公布号	EP1372186(B1)	申请公布日期	2008.12.10
申请号	EP20030018179	申请日期	2000.10.31
申请人	AT	发明人	DE
分类号	H01L21/306;H01L21/00;H01L21/683;H01L21/304	主分类号	H01L21/306
代理机构		代理人
主权项
地址

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