| 发明名称 |
Partial vacuum environment imprinting |
| 摘要 |
The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.
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| 申请公布号 |
US7462028(B2) |
申请公布日期 |
2008.12.09 |
| 申请号 |
US20070695263 |
申请日期 |
2007.04.02 |
| 申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
CHERALA ANSHUMAN;LAD PANKAJ B.;MCMACKIN IAN M.;CHOI BYUNG-JIN |
| 分类号 |
B28B11/08 |
主分类号 |
B28B11/08 |
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