发明名称 Substrate table with windows, method of measuring a position of a substrate and a lithographic apparatus
摘要 A substrate table is provided with an optical system that includes a first window and a second window arranged to allow radiation to pass into an optical arm. At least two mirrors are provided within the optical arm and are arranged to reflect radiation that is passed through the windows. At least two lenses are positioned to receive radiation reflected from the mirrors, wherein the first window is provided with a first alignment mark and the at least two mirrors and at least two lenses are arranged to form an image of the first alignment mark at the second window. A second alignment mark is provided in the second window, or in the substrate table at a location adjacent to the second window.
申请公布号 US7463337(B2) 申请公布日期 2008.12.09
申请号 US20050321467 申请日期 2005.12.30
申请人 ASML NETHERLANDS B.V. 发明人 VAN BUEL HENRICUS WILHELMUS MARIA;BIJNEN FRANCISCUS GODEFRIDUS CASPER
分类号 G03B27/58 主分类号 G03B27/58
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