发明名称 |
Method and system for cleaning a photomask |
摘要 |
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from the chemical cleaner to form insoluble precipitates, and rinsing the photomask with a fluid to remove the insoluble precipitates from the photomask.
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申请公布号 |
US7462248(B2) |
申请公布日期 |
2008.12.09 |
申请号 |
US20070671570 |
申请日期 |
2007.02.06 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHIU CHIH-CHENG;CHANG CHING-YU |
分类号 |
B08B3/04 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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