| 摘要 |
In an embodiment, an ion beam profiler center measuring apparatus is releasably mounted to the ion beam profiler and measures a center position of an ion beam profiler using a laser beam. Accurate data for a profiler center position may be obtained without direct contact with a platen. A procedure to measure and adjust a center position of the ion beam profiler may be easily performed regardless of an operator's dexterity, requiring relatively little time.
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