发明名称 |
METHOD OF FABRICATION PN JUNCTION AND METHOD OF TESTING DEVICE USING THE SAME |
摘要 |
The PN junction formation and PN joining formation process and device inspecting method using the same is provided to simplify the process by reducing the number of processes and to lower the breakdown voltage.. The PN joining formation process comprises as follows. A step is for forming the mask which exposes a part of the wafer(11) to form the local PN junction. A step is for introducing an N type impurity in the exposed domain of wafer by a diffusion method. A step is for introducing a p type impurity in wafer by an ion injection method. A step is for forming the PN junction by performing the thermal process for diffusing the impurity one time.
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申请公布号 |
KR100872803(B1) |
申请公布日期 |
2008.12.09 |
申请号 |
KR20070063585 |
申请日期 |
2007.06.27 |
申请人 |
SILTRON INC. |
发明人 |
LEE, WOO SUNG;KIM, JA YOUNG;PARK, SUNG KYU;KIM, BYOUNG CHANG;PARK, BONG GI |
分类号 |
H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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