发明名称 TWIN TARGET SPUTTERING APPARATUS
摘要 A twin target sputtering device for uniformly enforcing the electrode deposition of OLED governing the efficiency of the emitting device is provided. A twin target sputtering device for reducing damage in sputtering comprises a chamber including the substrate mounting portion mounting the substrate(13) for the organic light-emitting device; a first target(2a) and a second target(2b) which is faced it puts the predetermined distance it is prepared within the chamber, and the first target and the housing(3) mounted between the second target; a reaction gas introduction portion for introducing the reaction gas within the housing; and a pipe(4) which the reaction gas introduction portion is inserted into the housing and a plurality of gas blowers formed in the pipe into the constant interval.
申请公布号 KR20080106748(A) 申请公布日期 2008.12.09
申请号 KR20070054570 申请日期 2007.06.04
申请人 TOP ENGINEERING CO., LTD. 发明人 LEE, SANG HYUN
分类号 C23C14/34;C23C14/35 主分类号 C23C14/34
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