| 发明名称 |
POLYMERIC INHIBITORS FOR ENHANCED PLANARIZATION |
| 摘要 |
<p>The invention provides a chemical-mechanical polishing system comprising a polishing component, a surfactant, and a liquid carrier. The invention further provides a method of chemically-mechanically polishing a substrate with the polishing system. ® KIPO & WIPO 2009</p> |
| 申请公布号 |
KR20080106490(A) |
申请公布日期 |
2008.12.08 |
| 申请号 |
KR20077026848 |
申请日期 |
2006.03.31 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
CHERIAN ISAAC;ZHOU RENJIE;GRUMBINE STEVEN;ZHANG JIAN |
| 分类号 |
C09K3/14;C09G1/02 |
主分类号 |
C09K3/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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