首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Process for adjusting the strain on the surface or inside a substrate made of a semiconductor material
摘要
申请公布号
KR100872041(B1)
申请公布日期
2008.12.05
申请号
KR20060132034
申请日期
2006.12.21
申请人
发明人
分类号
H01L21/20;H01L21/22;H01L21/265;H01L21/324
主分类号
H01L21/20
代理机构
代理人
主权项
地址
您可能感兴趣的专利
SLIVER STACKING DEVICE
SMALL DC MOTOR
BASE METALS RECOVERY BY ADSORPTION OF CYANO COMPLEXES ON ACTIVATED CARBON.
IMPROVEMENTS RELATING TO SPATIAL LIGHT MODULATORS
PLANE ANTENNA
SOLID-STATE IMAGE PICKUP DEVICE
OUTPUT SYSTEM FOR SPREAD SHEET DATA
METHOD AND DEVICE FOR CONTROL OF GAS SUPPLY
JOINING METHOD OF ROLLED STOCK
ACCESS CONTROL SYSTEM
TELEVISION RECEIVER WITH PLURAL SCREENS
GAS BURNER
ABSOLUTE ENCODER
ILLUMINATOR FOR PICTURE READING AND PICTURE READER
DNA- SEKVENSER, REKOMBINANT-DNA- MOLEKYLER OCH FOERFARANDEN FOER FRAMSTAELLNING AV HUMANT INTERFERON AV -TYP OCH VAL AV DNA-SEKVENSEN.
PROCESSING SYSTEM FOR ALARM ON TRANSMITTER
ANTENNA INPUT DEVICE
PHASE ADJUSTING STRUCTURE OF RESONATOR
HYBRID CIRCUIT
CABINET STRUCTURE OF ELECTRONIC COMMUNICATION DEVICE