发明名称 Method for Producing a Field-Effect Transistor, Field-Effect Transistor and Integrated Circuit Arrangement
摘要 A method for producing a tunnel field-effect transistor is disclosed. Connection regions of different doping types are produced by means of self-aligning implantation methods.
申请公布号 US2008296703(A1) 申请公布日期 2008.12.04
申请号 US20050814364 申请日期 2005.12.09
申请人 INFINEON TECHNOLOGIES AG 发明人 KAKOSCHKE RONALD;TEWS HELMUT
分类号 H01L29/00;H01L21/425 主分类号 H01L29/00
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