| 摘要 |
PROBLEM TO BE SOLVED: To prevent atmosphere in a processor-side space from flowing out to a clean room from a gap while maintaining the gap between a shutter and a side wall and keeping pressure in the processor-side space to positive pressure. SOLUTION: A cover 43 of a substrate storing container 41 placed on a placing part 22 of a placing stand 21 is lifted up by rise of an ascending/descending part 23. A tube part 24 rises by rise of the ascending/descending part 23 and a shutter board 28 covering a carrying in/out part 4 moves upward. An opening part 25 confronts with the carrying in/out part 4. Peripheral atmosphere is sucked from a groove 51 formed at a periphery of the carrying in/out part 4 on a side wall 2. Atmosphere in the processor space S is prevented from leaking into the clean room CR from the gap between the shutter board 28 and the side wall 2. COPYRIGHT: (C)2009,JPO&INPIT
|
