| 摘要 |
The present invention relates to a NAND flash memory array having vertical channels and sidewall gate structure and a fabricating method of the same. A NAND flash memory array of the present invention has insulator strip structure and one or more semiconductor strips are next to the both sides of the insulator strip. A NAND flash memory array of the present invention allows for an improvement of the integrity by decreasing the memory cell area by half and less, and solves the problems of the conventional three-dimensional structure regarding isolation between not only channels but also source/drain regions at the bottom of trenches. A method for fabricating the NAND flash memory array having a pillar structure, which uses the conventional CMOS process and an etching process with minimum masks, enables to cut down costs.
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