发明名称 Double gate manufactured with locos techniques
摘要 This invention discloses a trenched semiconductor power device that includes a trenched gate surrounded by a source region encompassed in a body region above a drain region disposed on a bottom surface of a substrate. The trenched gate further includes at least two mutually insulated trench-filling segments with a bottom insulation layer surrounding a bottom trench-filling segment having a bird-beak shaped layer on a top portion of the bottom insulation attached to sidewalls of the trench extending above a top surface of the bottom trench-filling segment.
申请公布号 US2008296673(A1) 申请公布日期 2008.12.04
申请号 US20070807444 申请日期 2007.05.29
申请人 ALPHA & OMEGA SEMICONDUCTOR, LTD 发明人 TAI SUNG-SHAN;HU YONGZHONG
分类号 H01L29/94;H01L21/336 主分类号 H01L29/94
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