发明名称 Lithographic support structure
摘要 The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.
申请公布号 US2008297758(A1) 申请公布日期 2008.12.04
申请号 US20080213930 申请日期 2008.06.26
申请人 ASML NETHERLANDS B.V. 发明人 TINNEMANS PATRICIUS ALOYSIUS JACOBUS;BUIS EDWIN JOHAN;DONDERS SJOERD NICOLAAS LAMBERTUS;VAN ELP JAN;HOOGKAMP JAN FREDERIK;VAN MEER ASCHWIN LODEWIJK HENDRICUS;SMULDERS PATRICK JOHANNES CORNELUS;SPANJERS FRANCISCUS ANDREAS CORNELIS;VERMEULEN JOHANNES PETRUS MARTINUS BER;VISSER RAIMOND;TEGENBOSCH HENRICUS GERARDUS;VAN DEN BERG JOHANNES CHARLES ADRIANUS;VAN DE SANDE HENRICUS JOHANNES ADRIANUS;VERVOORT THIJS
分类号 B08B1/00;G03B27/58;B25J13/08;B65G49/07;G03F7/20;H01L21/027;H01L21/304;H01L21/677;H01L21/683;H02N13/00 主分类号 B08B1/00
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