MASK MOLD AND MANUFACTURING METHOD THEREOF AND METHOD FOR FORMING LARGE-AREA FINE PATTERN USING THE MASK MOLD
摘要
<p>A mask mold and a manufacturing method, and a large area micro-pattern molding method using the same are provided to apply the fine patterns of nano-scale or complicated three dimensional shapes with the simple method and the cheap cost. A mask mold manufacturing method comprises the following steps: the step for coating the resist onto a plurality of miniature molds in which a mask or a micro-pattern is imprinted(110); the step for imprinting the micro-pattern on the resist by pressurizing a plurality of miniature molds(150); the step for solidifying the resist(160); the step for separating the resist from the plurality of molds(170).</p>
申请公布号
KR20080105524(A)
申请公布日期
2008.12.04
申请号
KR20070053228
申请日期
2007.05.31
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, JEONG GIL;CHO, YOUNG TAE;SIM, YOUNG SUK;CHO, SUNG HOON;LEE, SUK WON;PARK, SEON MI;KWON, SIN;SEO, JUNG WOO;PARK, JUNG WOO;CHO, SUNG WOO