| 摘要 |
A device for transferring and cleaning the substrate is provided to reduce the failure rate of the substrate due to the contact by cleaning the substrate while transferring and lifting the substrate. A substrate transfer and cleaning device comprise the water buoyancy unit, the emission unit for the substrate transfer, the water tank, and the feed port. The water buoyancy unit lifts up the loaded substrate with the hydraulic power. The emission unit for the substrate transfer sprays the water to the rising state of the substrate by the water buoyancy unit to be moved to the next process position. The water tank and the feed port supply the water with the constant pressure to the blow nozzle for the substrate transfer and the water buoyancy unit. While substrate is transferred into the rising state by the water buoyancy, the substrate is washed.
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