发明名称 Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold
摘要 Disclosed are a mask mold, a manufacturing method thereof, and a method for forming a large-sized micro pattern using the manufactured mask mold, in which the size of a nano-level micro pattern can be enlarged using a simple method with low cost and interference and stitching errors between cells forming a large area can be minimized. The method for manufacturing the mask mold includes the operations of coating resist on a mask or a plurality of small molds having an engraved micro pattern, pressing the small molds to imprint the micro pattern on the resist, curing the resist, and releasing the small molds from the resist.
申请公布号 US2008299467(A1) 申请公布日期 2008.12.04
申请号 US20080149520 申请日期 2008.05.02
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM JEONG GIL;CHO YOUNG TAE;SIM YOUNG SUK;CHO SUNG HOON;LEE SUK WON;PARK SEON MI;KWON SIN;SEO JUNG WOO;PARK JUNG WOO;CHO SUNG WOO
分类号 G03F1/14;B05D3/06;B29C33/38;B29C59/02;B81C99/00;G03F7/20;H01L21/027 主分类号 G03F1/14
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