发明名称 |
Dosage accuracy monitoring systems of implanters |
摘要 |
An apparatus for monitoring beam currents of an implanter is provided. The apparatus includes a beam-sensing unit for sensing the beam currents; a position-determining unit for determining scan positions; and a computing unit. The computing unit is configured to perform the functions of receiving the beam currents from the beam-sensing unit; receiving the scan positions from the position-determining unit; and determining a drift status of the implanter from the beam currents, wherein the computing unit is configured to receive the beam currents and the scan position periodically between a starting time and an ending time of a scan process of the implanter.
|
申请公布号 |
US2008296472(A1) |
申请公布日期 |
2008.12.04 |
申请号 |
US20070809644 |
申请日期 |
2007.06.01 |
申请人 |
CHEN JUAN-LIN;YEH YUNG-FU;LEE YUK-TONG;CHENG NAI-HAN |
发明人 |
CHEN JUAN-LIN;YEH YUNG-FU;LEE YUK-TONG;CHENG NAI-HAN |
分类号 |
H01J37/244 |
主分类号 |
H01J37/244 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|