发明名称 PROCESS AND APPARATUS FOR PRODUCING TRICHLOROSILANE AND PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON
摘要 A process for producing trichlorosilane, comprising the conversion reaction step (first reaction step) of carrying out a conversion reaction of raw material tetrachlorosilane and hydrogen within the first temperature range of 1000° to 1900°C to thereby form a first reaction product gas containing trichlorosilane, dichlorosilylene, hydrogen chloride and higher silane compounds; the first cooling step of cooling the first reaction product gas to 950°C or below within 1 sec (excluding cooling to below 600°C within 0.01 sec); the second reaction step of holding the gas within the second temperature range of 600° to 950°C for a period of 0.01 to 5 sec; and the second cooling step of cooling the second reaction product gas after the second reaction step to below 600°C.
申请公布号 WO2008146741(A1) 申请公布日期 2008.12.04
申请号 WO2008JP59544 申请日期 2008.05.23
申请人 MITSUBISHI MATERIALS CORPORATION;SAIKI, WATARU;MIZUSHIMA, KAZUKI;URUSHIHARA, MAKOTO 发明人 SAIKI, WATARU;MIZUSHIMA, KAZUKI;URUSHIHARA, MAKOTO
分类号 C01B33/107 主分类号 C01B33/107
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