发明名称 METHOD FOR FABRICATION OF SEMICONDUCTOR LIGHT-EMITTING DEVICE
摘要 A method for producing a semiconductor light-emitting device includes stacking at least a first conductive type semiconductor layer (2), an active layer (3) and a second conductive type semiconductor layer (4) on a substrate (1) to form a wafer, then forming on a side of growth surfaces of the semiconductor layers first trenches (40) exposing the first conductive type semiconductor layer, further forming second trenches (50) reaching the substrate from above the first trenches by using a laser beam, subsequently forming trenches (60) from the substrate at the positions corresponding to the second trenches, and finally cutting the wafer into chips. The produced semiconductor chips provide an enhanced efficiency of extracting emitted light even when the end faces thereof are smooth surfaces and they allow the semiconductor layer to be cut without distorting the end faces of the chips. ® KIPO & WIPO 2009
申请公布号 KR20080106377(A) 申请公布日期 2008.12.04
申请号 KR20087029061 申请日期 2008.11.27
申请人 SHOWA DENKO K.K. 发明人 YAKUSHIJI KOJI
分类号 H01L33/06;H01L33/32;H01L33/40 主分类号 H01L33/06
代理机构 代理人
主权项
地址