| 摘要 |
<p>An exposure system and a device manufacturing method are provided to accurately adjust the temperature and limit the footprint space of the exposure apparatus. An exposure system comprises the exposure apparatus for exposing the substrate(300) and the apparatus(100) for supplying the fluid by interposing the flow channel in the exposure apparatus. The apparatus for supplying the fluid comprises the fluid rapid feeding unit, the first temperature control unit, the unit for removing, the first temperature integrated metrology(110), and the second temperature control unit. The fluid rapid feeding unit circulates the fluid by interposing the exposure apparatus. The first temperature control unit adjusts the temperature of the fluid. The unit for removing removes the unnecessary material among the fluid. The first temperature integrated metrology is arranged between the first temperature control unit and unit for removing. The second temperature control unit adjusts the temperature of the fluid.</p> |
