发明名称 |
WAFER SURFACE INSPECTION APPARATUS AND WAFER SURFACE INSPECTION METHOD |
摘要 |
A wafer surface inspection method and apparatus of high sensitivity, and free from performance degradation in terms of cleanliness, coordinate repeatability of foreign particles and the like. Gas for cooling is sprayed onto a laser irradiation position on the wafer surface to prevent an increase in temperature of the foreign particles and to suppress break-down of the foreign particles.
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申请公布号 |
US2008297781(A1) |
申请公布日期 |
2008.12.04 |
申请号 |
US20080187041 |
申请日期 |
2008.08.06 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
ZAMA KAZUHIRO;HACHIYA MASAYUKI |
分类号 |
G01N21/896 |
主分类号 |
G01N21/896 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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