SUBSTRATE TREATING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a substrate treating system which suppresses reliquefaction of a vaporized material and can improves the productivity. SOLUTION: In the substrate treating system where liquid material is vaporized and is introduced into a treatment room and a desired film is formed on a substrate by equipped with a vaporizer which is provided with a vaporization chamber having several outlets, a flow passage for discharging the vaporized material from one of the outlets via a valve is arranged; another flow passage for supplying the vaporized material to a reaction chamber from another outlet via a valve is arranged; and discharge and supply of the vaporized material is switched by operating opening and closing of the valves. COPYRIGHT: (C)2009,JPO&INPIT