SUPER NARROW BAND, TWO-CHAMBER, HIGH REPETITION RATE GAS DISCHARGE LASER SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a seed light injection module gas discharge laser system capable of generating a high quality-pulse laser beam with about 4,000 Hz of pulse repetition rate or more and a pulse energy of about 5 mJ or more. SOLUTION: The system is provided with two separate discharge chambers, and one is a part of a master oscillator that generates a super narrow band seed beam amplified in a second discharge chamber. The two discharge chambers can be separately controlled, and enable the system to optimize a wavelength parameter in the master oscillator and a pulse energy parameter in an amplifying chamber. A preferable embodiment of an ArF excimer laser system is configured as a MOPA, and is particularly designed to be used as a light source of an integrated circuit lithography. COPYRIGHT: (C)2009,JPO&INPIT