发明名称 VACUUM FILM-FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method having a step of stably depositing a sublimated material on a synthetic resin film so as to improve characteristics of a sublimated material film to be formed on the synthetic resin film. SOLUTION: This film-forming method includes preliminarily and uniformly heating a sublimating material by using a microwave-generating means. The sublimating material to be irradiated with an electron beam emitted from an electron beam generating means has an approximately smooth surface. A material container is movable. A mesh-shaped filter made from a refractory material is provided in between the material container and a cooling roller. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008291308(A) 申请公布日期 2008.12.04
申请号 JP20070137690 申请日期 2007.05.24
申请人 TOPPAN PRINTING CO LTD 发明人 NAKAJIMA TAKAYUKI;ISHII RYOJI;SUZUKI HIROSHI;NAKAJIMA HIDEMI
分类号 C23C14/24;C23C14/10;C23C14/22;C23C14/30 主分类号 C23C14/24
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