发明名称 |
VACUUM FILM-FORMING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method having a step of stably depositing a sublimated material on a synthetic resin film so as to improve characteristics of a sublimated material film to be formed on the synthetic resin film. SOLUTION: This film-forming method includes preliminarily and uniformly heating a sublimating material by using a microwave-generating means. The sublimating material to be irradiated with an electron beam emitted from an electron beam generating means has an approximately smooth surface. A material container is movable. A mesh-shaped filter made from a refractory material is provided in between the material container and a cooling roller. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008291308(A) |
申请公布日期 |
2008.12.04 |
申请号 |
JP20070137690 |
申请日期 |
2007.05.24 |
申请人 |
TOPPAN PRINTING CO LTD |
发明人 |
NAKAJIMA TAKAYUKI;ISHII RYOJI;SUZUKI HIROSHI;NAKAJIMA HIDEMI |
分类号 |
C23C14/24;C23C14/10;C23C14/22;C23C14/30 |
主分类号 |
C23C14/24 |
代理机构 |
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地址 |
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