| 摘要 |
Method and plasma treatment apparatus for treatment of a substrate, using a pulsed atmospheric pressure glow discharge plasma in a treatment space (5) filled with a gas composition. At least two electrodes (2, 3) are connected to a power supply (4) for providing electrical power to the at least two electrodes (2, 3), a gas supply device (8) for providing a gas composition to the treatment space (5), and a temperature control unit (16) for controlling the temperature of the substrate within a range from above 70 up to 130°C. |
