COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION

摘要

This invention provides a composition for antireflection film formation, for use in the formation of an antireflection film on a resist film, which is easy to handle, and, as with an antireflection film using PFOS, can form an antireflection film having excellent optical properties. The composition for an antireflection film formation is a composition for use in the formation of an antireflection film provided on a resist film and contains a predetermined fluorine compound. In the composition for antireflection film formation, the predetermined fluorine compound contributes to an improvement in optical properties of the antireflection film,thus an antireflection film having excellent optical properties can be formed.