| 摘要 |
PROBLEM TO BE SOLVED: To improve a substrate heating efficiency and shorten a substrate heating time for throughput improvement and suppress heat discharge to the periphery, prevent metal pollution and the generation of a foreign substance for quality improvement in substrate treatment. SOLUTION: A substrate treating apparatus for heating and treating a substrate 4 housed in a treatment chamber 1 comprises a substrate mounting stand 3 on which the substrate is mounted and heated and a heat reflection board 25 opposed to the substrate mounting stand 3. COPYRIGHT: (C)2009,JPO&INPIT
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